Glossary
Oven for, e.g., Rapid Thermal Annealing (RTA) or Rapid Thermal Processing (RTA) processes, ohmic contact formation or diffusion processes. Anneals are usually short in duration whereupon the wafer temperature is accurately measured and controlled.
Our Rapid Thermal Annealing systems AO 500 /AO 600 are equipped for sample sizes up to 12 mm x 12 mm and a maximum temperature of 500°C / 600°C.
Our Rapid Thermal Annealing systems AO 500 /AO 600 are equipped for sample sizes up to 12 mm x 12 mm and a maximum temperature of 500°C / 600°C.
