Glossary
Rapid Thermal Annealing (RTA) is a process in which a wafer is heated in order to affect its electrical properties. Anneals are usually short in duration whereupon the wafer temperature is accurately measured and controlled.
Our Rapid Thermal Annealing systems AO 500 /AO 600 are equipped for sample sizes up to 12 mm x 12 mm and a maximum temperature of 500°C / 600°C.
Our Rapid Thermal Annealing systems AO 500 /AO 600 are equipped for sample sizes up to 12 mm x 12 mm and a maximum temperature of 500°C / 600°C.
