Substrate-Manipulation

Loadlock Heater WH 40
Loadlock Heater WH
40
Main purpose of the Loadlock Heater WH 40 is the controlled heating of both chamber walls and substrates within a loadlock under ultra-high vacuum conditions.
Oxygen Resistant Substrate Manipulators SH-O
Oxygen Resistant Substrate Manipulators
SH-O
Using SiC or noble metal heaters, MBE-Komponenten offers substrate manipulators and heated stations that are resistant to oxygen or other corroding atmospheres.
Substrate Manipulators SH
Substrate Manipulators
SH
SH substrate manipulators are used in standard III-V MBE, GaN MBE, SiC growth and SiGe MBE. Heaters made from tungsten, tantalum, graphite and SiC are available.
Wafer Heater WH
Wafer Heater
WH
The wafer heaters or heated stations - WH - are suited for all substrate heating applications where the full functionality of a substrate manipulator is not required.