WEZ Standard Effusion Cells are designed for evaporation or sublimation of a variety of elements and compounds in the temperature range from 700°C up to 1400°C.
NTEZ Low Temperatur Effusion Cells are designed for evaporation of high vapor pressure materials that require a precise temperature control and reproducibility.
HTEZ High Temperature Effusion Cells with self-supporting tungsten filaments are designed for clean UHV operation up to 1900°C
Equipped with a free-standing filament of thick tungsten wire, the model HTEZ-W is capable of reaching 2000°C. HTEZ-W cells work completely without any additional ceramic insulation.
The Silicon Sublimation Source SUSI was developed for growing thin Si layers, short period Si/Ge superlattices and Si/SiGe heterostructures. It allows for growth of thin epitaxial Si layers with a crystal quality not otherwise possible by evaporation
Beam Flux Monitor BFM - MBE Bayard-Alpert type ionization gauge, compatible with AML gauge controllers.
We provide suitable power and thermocouple extension cables for all our products. Ready-to-connect cable sets consist of power cables and TC extension lines including correct plugs and connectors.
The Carbon Doping Source SUKO-D is a highly optimized doping source for carbon p-type doping in III-V MBE.
The SUKO provides clean and stable flux at a low deposition rate of up to 2 Å/min. It has been successfully applied in a variety of research fields, e.g. graphene formation.
Water and liquid nitrogen cooled shrouds of various designs for use in combination with evaporation sources that have no integrated water cooling on their mounting flange.
Safety system which protects UHV-chambers from contaminations caused by unexpected warming up of the cryopump.