WEZ Standard Effusion Cells are designed for evaporation or sublimation of a variety of elements and compounds in the temperature range from 700°C up to 1400°C.
NTEZ Low Temperatur Effusion Cells are designed for evaporation of high vapor pressure materials that require a precise temperature control and reproducibility.
HTEZ High Temperature Effusion Cells with self-supporting tungsten filaments are designed for clean UHV operation up to 1900°C
Equipped with a free-standing filament of thick tungsten wire, the model HTEZ-W is capable of reaching 2000°C. HTEZ-W cells work completely without any additional ceramic insulation.
The Silicon Sublimation Source SUSI was developed for growing thin Si layers, short period Si/Ge superlattices and Si/SiGe heterostructures. It allows for growth of thin epitaxial Si layers with a crystal quality not otherwise possible by evaporation
The SUKO provides clean and stable flux at a low deposition rate of up to 2 Å/min. It has been successfully applied in a variety of research fields, e.g. graphene formation.
The Decomposition Source DECO is an ultra-pure source for P2 based on the decomposition of GaP. It is an affordable and easily operated alternative to valved phosphorus sources.
The High Temperature Source HTS allows evaporation of high vapor pressure materials, thereby combining very uniform material deposition with high flux rates.
The patented Organic Material Effusion Cell OME was specially designed for the evaporation of volatile organic substances at operating temperatures up to 300°C.
OREZ Oxygen Resistant Effusion Cells with nickel or noble metal heaters meet the requirements of oxide MBE applications with high oxygen background pressure.
PEZ Production Effusion Cells are designed to meet the particular requirements of production MBE systems, allowing the evaporation of a variety of elements.