- Tantalum or Tungsten heater
- Wafer or chamber temperatures according to setup (~400°C)
- Clean operation and high reliability
- Suitable for substrate sizes from 1" to 6"
- Customized solutions available
Introduction
The main purpose of the Loadlock Heater WH 40 is the controlled heating
of the chamber walls and also of substrates within a vacuum chamber
under high to ultra-high vacuum conditions.
The heater concept is based on the reliable and well-known Standard
Effusion Cells WEZ .
Application
WH 40 Loadlock Heaters are usually employed in research type UHV systems for heating substrates and / or chamber walls.
| Filament type | Ta or W wire heating filament |
| Thermocouple | W5%Re/W26%Re (type C) or Chromel/Alumel (type K) |
| Operating temperature | 700°C - 800°C |
| Bakeout temperature | 250°C |
| Mounting flange | DN40CF (O.D. 2.75") |
| Dimensions | L,D customer specific, OL=107 mm, AR= 54 mm |
Dimensions
Specific data
For general information on CF mounting flanges see Flange and Gasketdimensions .
If you are interested in a WH 40 Loadlock Heater, please contact us for more information.
