- Large variety of particular case sources available
- Customized solutions with special designs
- Close collaboration with customers
- Consideration of special customomers’ needs
- Manifacturing of every practicable request
Introduction
Source clusters can add more sources to your MBE system, either as doping source or as thin-film deposition source in nanosciences. We offer a large variety of source clusters based on our standard evaporation cells with two cells mounted on a single flange. Because of the large variety of different UHV systems each cluster is individually designed. If your requirements for source clusters are more specialized than our standard Dual Cluster Sources DCS and our standard Quad Cluster Sources QCS can provide, please contact us. Our experts will consult with you for manifacturing any practically possible request.
Some examples of specialized particular source clusters are shown below:
The combination of a mini high temperature effusion cell HTEZ and a standard effusion cell WEZ , mounted on a DN63 CF (O.D. 4.5") flange is shown in the picture on the right hand side.
The HTEZ includes an 1.5 cm³ Al 2 O 3 crucible, while the WEZ is equipped with a 10 cm³ PBN crucible. The integrated water cooling shroud prevents heating of the chamber as well as thermal interaction of the individual cells. The two separate shutters allow independent operation with minimized cross contamination.
Dual Cluster Source with DN63CF flange but with small O.D. diameter of
36 mm.
Fits in old Riber P32 MBE machines.
An example for a combination of two totally different cells on one flange is shown in the following two pictures on the right. The first one shows the overall view of DCS 63-SUSI/WEZ which is a combination of a Standard Effusion Cell WEZ with rotary shutter and a Silicon Sublimation Source SUSI .
The second foto shows the top view of the same Dual Cluster Source. Clearly visible is the PBN crucible of the Standard Effusion Cell WEZ and the silicon filament of the Silicon Sublimation Source SUSI.
Customized Source Cluster for old BALZERS UHV Systems. Water cooling and individual shutters vor two WEZ source type sources.
Two single standard effusion cells WEZ with a 10 cm³ PBN crucible in each cell are mounted in an angled position to allow the use of a horizontal port below the substrate. Each cell is equipped with an individual linear shutter. A water cooled shielding plate between the cells is thermally decoupling them effectively.
This cell is designed for horizontally oriented DN63CF (O.D. 4.5”)
ports.
The OEZ 63-2x2-22-KKS-SF holds two 2 cm³ crucibles that can be heated
individually. Both crucibles are encapsulated in a water cooled copper
shroud. This encourages a fairly low thermal cross talk of the
crucibles. This cell is equipped with a linear push-pull shutter that
enables the user to open/close the crucibles independently.
A further source cluster variant is the QCS 100 on the adjacent foto. This customized variant of QCS 100 comprises three CRU 10-22 crucibles and one conical CRU 2-22 crucible and a heater concept with two hot lip filament heaters HL , one cold lip CL and one standard filament SF heater. The shutters have a pneumatic RPM drive unit for fast rotary shutter motion.
Application
Our customized source clusters are commonly used for doping or thin film applications whenever an increase of capacity of the used system is desired.
Crucibles
The standard crucible material is PBN, but other crucible materials are also available. Crucible sizes, shapes and material are coordinated in close collaboration with the customer respecting design and application.
