OCTOPLUS-O 350 - OCTOPLUS-O for Oxides -

Oxide MBE System with efficient differential pumping
Applications for many oxide and metal materials
8 MBE source ports DN63CF (O.D. 4.5"), extended version with up to 12 ports
Wide range of source options; compatible to multi-pocket e-beam evaporation
Small samples or wafer sizes up to 2"
Strong differential pumping
Ozone-resistant SiC substrate heater
or CO₂ laser substrate heating
Ozone injection close to substrate
In-situ characterization capability
Strong support by PhD MBE experts

The OCTOPLUS-O 350 is very thoroughly designed for oxide layer deposition. The unique design with effective differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS-O 350 system can be easily adapted to small wafer segments as well as to 2 inch wafers. The field-proven vertical chamber design of the OCTOPLUS-O 350 plus various state-of-the-art components allow layer by layer precise MBE growth.

Outstanding features of the OCTOPLUS-O 350 are the special design, high reliability and versatility of the system and its compactness. These features make our systems particularly suited for applications in research and development. Nonetheless specific production processes are also covered.

The standard version of the OCTOPLUS-O 350 comprises 8 source ports 4.5 inch (DN63CF) flange size. A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.

Options for OCTOPLUS-O 350:

Additional load-lock and buffer chambers
Wafer transfer system
Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.
Retractable sources for reloading without chamber venting and possibility of differentially pumping the sources
Multiple turbomolecular pumps for differential pumping
Ozone source with or without enrichment
Oxygen plasma source
Software / hardware control system
In-situ characterization tools, e.g. ion gauge, quartz, pyrometer, RHEED, QMA

Compact Ozone Source without enrichment up to 15% Ozone

We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers’ requirements.

CO₂ laser heating allows substrate heating up to more than 1400°C.
A backside metal coating of the substrate is not needed, since the CO₂ laser light is strongly absorbed by various oxide substrates.
Please see corresponding paper .

A well-manageable in-situ characterization is obtained by using quartz micro-balance, RHEED systems or quadrupole mass analyzers (QMA).

CO2 substrate heating — $$Al_2O_3$$ substrate heated by $$CO_2$$ laser. (Courtesy of Prof. J. Mannhart, MPI-FKF Stuttgart)

We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.

The OCTOPLUS-O 350 is in use in leading laboratories. On demand we transmit a detailed list of references.

Technical data

Size of deposition chamber	350mm / 450mm (12-port version)
Base pressure	< 5x10^-11 mbar (depends on pumping system)
Pumping	cryopump, turbopump, TSP or ion getter pump
Cooling Shroud	LN2 or other cooling liquid on request
Substrate heater temperature	up to 800°C, 1000°C or 1400°C
Substate size	up to 2" diameter
Bakeout temperature	up to 200°C
Source ports	8 source ports DN63CF (O.D. 4.5")
Source types	effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources
Shutters	soft-acting linear or rotary shutters
In-situ monitoring	ion gauge, QCM, pyrometer, RHEED, QMA
Sample transfer	linear transfer rod, manual or semi-automatic
Load lock	turbo-pumped, magazine with 6 substrates
MBE control software	Tiny Tusker
Service	system installation and acceptance testing
MBE training	by MBE experts

Examples for applications and corresponding sources

	Effusion Cells WEZ , NTEZ HTEZ	Sublimation Sources SUKO , SUSI HTS , DECO	Ozone Sources O3S	Plasma Sources	E-Beam Evaporators EBVV , EBVM
Oxides	Fe, Ni, Mn, Bi, Eu, Ga, ...	C	Ozone	O	Ir, La, Ni, Ru, Mo, Ta, W, Nb, ...

Octoplus-O 350 general view

Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from the many years of active research experience of its team members. We now look back on about 30 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.