The new Free Microplasma Source FMP provides a pure localized plasma for substrate cleaning applications, surface preparation or layer growth within an UHV chamber or MBE system at low chamber pressure.
Free Microplasma Source FMPThe new Free Microplasma Source FMP provides a pure localized plasma for substrate cleaning applications, surface preparation or layer growth within an UHV chamber or MBE system at low chamber pressure. This setup provides high purity plasma creation with effectively reduced wall interaction as well as a drastically reduced RF power consumption due to the small plasma size.
The Free Microplasma Source FMP can be mounted into common MBE growth chambers.
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