OCTOPLUS 600

MBE system for up to 6 inch samples with up to 12 ports for effusion cells

Octoplus 600

 Datasheet

  • State-of-the-art MBE system for research and production

  • Applications: III/V, II/VI or other material heterostructures

  • 12 source ports

  • Wide range of source options, e.g. effusion cells, valved sources etc.

  • Substrate sizes 4", 6" or 3x2"; face-down wafer geometry

  • Automated wafer transfer

  • Strong UHV pumping system

  • LN2 cooling shroud

  • In-situ characterization capability

  • Professional support by PhD MBE experts

General Information

Octoplus 600
Fully automated wafer transfer by central handling arm.

The OCTOPLUS 600 system has been developed for the growth of high quality III-V heterostructures on multi wafer 3x2 inch or single wafer 4 inch or 6 inch substrate. The MBE chamber is equipped with up to 12 effusion cells and valved crackers for deposition. The substrate manipulator applies to pyrolytic graphite or alternatively tungsten or tantalum heaters. The OCTOPLUS 600 MBE system is field-proven and ideally suited for III/V, II/VI and other heterostructure growth for applications in research and production processes.

Outstanding features of the OCTOPLUS 600 are the high reliability and versatility of the system.

The standard version of the OCTOPLUS 600 comprises 12 radially arranged source ports, 3 further source ports can be added on request. A rapid pump-down load lock chamber with wafer magazine, a heated station and the fully automated central transfer allow easy substrate introduction and handling.

OCTOPLUS 600 EBV MBE system option
OCTOPLUS 600 EBV MBE system option

The OCTOPLUS 600 is available with an EBV option to replace some of the effusion cell flanges and instead mount horizontal electron beam evaporators.

With this option the OCTOPLUS 600 can be used as a dedicated Si-Ge MBE with two horizontal 100 cm³ EBV sources.

At Dr. Eberl MBE-Komponenten GmbH we have very detailed knowledge in the group IV elements C, Si and Ge MBE and are happy to discuss such an application in further detail with you.

A version with one horizontally mounted 6-pocket electron beam evaporator allows working with layers containing high temperature materials such as e.g. W, Ta, Nb, Mo, Pt. This can be used for metallization, growth of superconductors or even transition metal dichalcogenides.

Options for OCTOPLUS 600

  • Additional load-lock, heated station, or buffer chamber

  • Manual wafer transfer with linear transfer tunnel system (up to 4inch wafer)

  • Or fully automated wafer transfer with central distribution chamber (up to 6inch wafer)

  • Wide range of components like effusion cells, e-beam-evaporators, sublimation sources, valved cracker sources, gas sources, manipulators

  • Software/hardware control system

  • Pumping system (cryopumps, ion getter pumps, etc.)

  • In-situ characterization tools, e.g. RHEED, BFM, Quartz Crystal Microbalance (QCM), Pyrometer

Technical Data

Size of deposition chamber
600 mm I.D.
Base pressure
< 5x10-11 mbar
PumpingTSP, ion getterpump, cryopump and/or turbopump
Cooling ShroudLN2 or other cooling liquid on request
Substrate heater temperatureup to 800°C, 1000°C or 1200°C
Substate size4",  6" or multi-wafer 3x2"
Bakeout temperatureup to 200°C
Source ports12 ports DN100CF
Source types
effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources
Shutters
soft-acting linear shutters with low flux transient
In-situ monitoringion gauge, QCM, pyrometer, RHEED, QMA
Sample transferautomated transfer with wafer face-down geometry
Load lockmagazine with 10 substrates turbo-pumped
MBE control softwareTiny Tusker
Servicesystem installation and acceptance testing
MBE trainingby MBE experts

Examples for applications and corresponding sources

Effusion Cells
WEZ , NTEZ
OME , HTEZ
Sublimation Sources
SUKO , SUSI
HTS , DECO
Valved Sources
VACS , VGCS
VCS , VSCS
Plasma Sources
FMP
E-Beam
Evaporators
EBVV
III/VGa, In, AlC, Si dopingAs, P, Sb
II/VIZn, Cd, BeS, Se, TeN-doping
IVGe, Sn, PbB, P, Sb dopingSi, Ge
GaNGa, In, AlN
MetalsCu, Al, Ni, Co, ...Pt, Ta, Pd, Mo, W
Topological InsulatorsGe, Sn, Te, Bi, GeSbSe, TeB
Graphene / SiliceneC, Si
OxidesFe, Ni, Mn, Bi, Eu,
Ga, ...
O
Thin Film Solar CellsCu, Ga, In, Zn, NaF,
Fe, Sn
S, Se

Based on many years of active research experience in the field of growth and doping applications our team develops and manufactures the OCTOPLUS 600 system and all essential components. Each product is assembled and carefully tested in-house.

We are happy to discuss your MBE system specifications and give competent advice for your application.
The OCTOPLUS 600 is in use in leading laboratories. On demand we transmit a detailed list of references. Please contact our sales department for further questions and specification information.