Oxide MBE system with efficient differential pumping
Applications for many oxide and metal materials
8 MBE source ports DN63CF (O.D. 4.5"), extended version with up to 12 ports
Wide range of source options; compatible to multi-pocket e-beam evaporation
Small samples or wafer sizes up to 2"
Strong differential pumping
Ozone-resistant SiC substrate heater or CO2 laser substrate heating
Ozone injection close to substrate
In-situ characterization capability
Professional support by PhD MBE experts
General Information
The OCTOPLUS-O 350 is very thoroughly designed for oxide layer deposition. The unique design with effective differential pumping allows depositing oxide layers in high Oxygen or Ozone partial pressure without strong degeneration of the hot sources. The OCTOPLUS-O 350 system can be easily adapted to small wafer segments as well as to 2 inch wafers. The field-proven vertical chamber design of the OCTOPLUS-O 350 plus various state-of-the-art components allow layer by layer precise MBE growth.
Outstanding features of the OCTOPLUS-O 350 are the special design, high reliability and versatility of the system and its compactness. These features make our systems particularly suited for applications in research and development. Nonetheless specific production processes are also covered.
The standard version of the OCTOPLUS-O 350 comprises 8 source ports 4.5 inch (DN63CF) flange size. A rapid pump-down load lock chamber with a horizontal working transfer rod system allows easy substrate introduction without breaking the vacuum of the MBE chamber.
Options for OCTOPLUS-O 350
Additional load-lock and buffer chambers
Wafer transfer system
Sources: effusion cells, (multi-pocket) e-beam evaporators, etc.
Retractable sources for reloading without chamber venting and possibility of differentially pumping the sources
Multiple turbomolecular pumps for differential pumping
Ozone source with or without enrichment
Oxygen plasma source
Software / hardware control system
In-situ characterization tools, e.g. ion gauge, Quartz Crystal Microbalance (QCM), pyrometer, RHEED, QMA
We provide different kinds of effusion cells, valved cracker sources, gas sources and substrate manipulators according to customers' requirements.
CO2 laser heating allows substrate heating up to more than
1400°C.
A backside metal coating of the substrate is not needed, since the CO2 laser light is strongly absorbed by various oxide
substrates.
Please see corresponding
paper .
A well-manageable in-situ characterization is obtained by using Quartz Crystal Microbalance (QCM), RHEED systems or quadrupole mass analyzers (QMA).
We are happy to discuss your MBE system specifications and give competent advice for your application. Do not hesitate to contact us.
The OCTOPLUS-O 350 is in use in leading laboratories. On demand we transmit a detailed list of references.
Technical data
| Size of deposition chamber | 350 mm / 450 mm (12-port version) |
| Base pressure | < 5x10-11 mbar (depends on pumping system) |
| Pumping | cryopump, turbopump, TSP or ion getter pump |
| Cooling Shroud | LN2 or other cooling liquid on request |
| Substrate heater temperature | up to 800°C, 1000°C or 1400°C |
| Substate size | up to 2" diameter |
| Bakeout temperature | up to 200°C |
| Source ports | 8 source ports DN63CF (O.D. 4.5") |
| Source types | effusion cells, e-beam evaporators, sublimation sources, valved cracker sources, gas sources |
| Shutters | soft-acting linear or rotary shutters |
| In-situ monitoring | ion gauge, QCM, pyrometer, RHEED, QMA |
| Sample transfer | linear transfer rod, manual or semi-automatic |
| Load lock | turbo-pumped, magazine with 6 substrates |
| MBE control software | Tiny Tusker |
| Service | system installation and acceptance testing |
| MBE training | by MBE experts |
Examples for applications and corresponding sources
| Effusion Cells WEZ , NTEZ HTEZ | Sublimation Sources SUKO , SUSI HTS , DECO | Ozone Sources O3S | Plasma Sources | E-Beam Evaporators EBVV , EBVM | |
| Oxides | Fe, Ni, Mn, Bi, Eu, Ga, ... | C | Ozone | O | Ir, La, Ni, Ru, Mo, Ta, W, Nb, ... |
Product range and quality of Dr. Eberl MBE-Komponenten GmbH benefit from the many years of active research experience of its team members. We now look back on about 30 years of development and manufacture of complex systems and components for multiple tasks in the applied research and production of compound semiconductor materials. Each product is assembled and carefully tested in-house by our MBE experts.
