Applications in fabrication of Oxides and Dielectrics
We develop oxide MBE systems and components for the deposition of oxide films in UHV systems. The products applied for the deposition of high TC superconductors yttrium barium copper oxide (YBCO) layers, complex oxides (such as SrTiO3 STO, BaTiO3 BTO), high-k dielectics as well as ZnO and other oxide materials. The MBE system and the components are designed to operate in a reactive oxygen environment. Substrate manipulators for these applications are equipped with oxygen resistant Pt or SiC heaters and are availiable in sizes up to 300mm silicon wafers.
BTO is a ferroelectric material with a large Pockels coefficient, making it attractive for electro-optic modulators in next-generation silicon photonics. However, direct growth of BTO on silicon is challenging due to lattice mismatch and nucleation issues. To overcome these, a buffer layer of strontium titanate (SrTiO3, STO) is first deposited - commonly by MBE - creating an ideal template for subsequent BTO growth and integration. The quality of this STO buffer is critical, as it determines the orientation and microstructure of the BTO film, which in turn influences its electro-optic properties.
MBE Komponenten also provides compatible Electron beam evaporation as well as special thermal evaporation sources are used for vacuum deposition of oxide layers. Also Hybrid MBE process routes can be integrated on request, where some of the elements are supplied as metal-organic precursors (such as Titanium isopropoxide). Sputter sources can be integrated upon request as well.
